PRISACARU, A.; SHIKIMAKA, O.; HAREA, E.; BURLACU, A.; ENACHI, M.; BRANISTE, T.
(Academy of Sciences of Moldova, 2014)
The possibility of Si texturing through the use of nano- and microscratching with subsequent chemical etching has been investigated. The influence of the scratching speed, orientation of the indenter (face-on, edge-on) and ...