Direct relief formation during holographic recording in nanomultilayers As2S3/Se

Abstract

The process of obtaining of high-efficiency relief holographic gratings includes laser irradiation and chemical etching of photosensitive film in a special selective solution. This process can be greatly enhanced by the use of recording media that can change its thickness in the process of light exposure. This eliminates the chemical treatment process in obtaining of relief-phase gratings. The aim of this work was to study the process of direct relief formation of holographic gratings in multilayer structures As2S3/Se.