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Zn/sup +//P/sup +/ and Zn/sup +//As/sup +/ co-implantation in InP single crystals

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dc.contributor.author URSAKI, V. V.
dc.contributor.author TIGINYANU, I. M.
dc.contributor.author ICHIZLI, V. M.
dc.contributor.author TERLETSKY, A. I.
dc.contributor.author PYSHNAYA, N. B.
dc.contributor.author RADAUTSAN, S. I.
dc.date.accessioned 2020-11-20T12:04:03Z
dc.date.available 2020-11-20T12:04:03Z
dc.date.issued 1996
dc.identifier.citation URSAKI, V. V., TIGINYANU, I. M., ICHIZLI, V. M. et al. Zn/sup +//P/sup +/ and Zn/sup +//As/sup +/ co-implantation in InP single crystals. In: International Semiconductor Conference: pros. CAS'96, 12 Oct. 1996, Sinaia, Romania, 1996, V. 2, pp. 401-404. ISBN 0-7803-3223-7. en_US
dc.identifier.uri https://doi.org/10.1109/SMICND.1996.557405
dc.identifier.uri http://repository.utm.md/handle/5014/11616
dc.description Acces full text: https://doi.org/10.1109/SMICND.1996.557405 en_US
dc.description.abstract The activation efficiency of zinc impurity co-implanted with P/sup +/ and As/sup +/ ions in InP was studied by Hall-effect measurements. Both P/sup +/ and As/sup +/ co-implantations followed by post-implantation annealing at 400 to 600/spl deg/C in InP single crystals have been found to result in a decrease of impurity activation. At the same time an improvement of activation efficiency was observed at annealing temperatures T/sub ann/>600/spl deg/C. en_US
dc.language.iso en en_US
dc.publisher IEEE en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject indium compounds en_US
dc.subject semiconductors en_US
dc.subject ion implantation en_US
dc.subject annealing en_US
dc.subject zinc en_US
dc.subject phosphorus en_US
dc.subject single crystals en_US
dc.subject indium phosphide en_US
dc.subject crystals en_US
dc.subject impurities en_US
dc.subject gallium arsenide en_US
dc.title Zn/sup +//P/sup +/ and Zn/sup +//As/sup +/ co-implantation in InP single crystals en_US
dc.type Article en_US


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