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dc.contributor.author SYRBU, N. N.
dc.contributor.author TIGINYANU, I. M.
dc.contributor.author URSAKI, V. V.
dc.contributor.author ZALAMAI, V. V.
dc.contributor.author POPA, Veaceslav
dc.contributor.author HUBBARD, S. M.
dc.contributor.author PAVLIDIS, Dimitris
dc.date.accessioned 2020-10-26T14:28:27Z
dc.date.available 2020-10-26T14:28:27Z
dc.date.issued 2003
dc.identifier.citation SYRBU, N. N., TIGINYANU, I. M., URSAKI, V. V. et al. Free excitons in strained MOCVD-grown GaN layers. In: MRS Internet Journal of Nitride Semiconductor Research. 2003, V. 8, p. e1. ISSN 1092-5783 (print), 1092-5783 (online). en_US
dc.identifier.uri https://doi.org/10.1557/S1092578300000442
dc.identifier.uri http://repository.utm.md/handle/5014/10896
dc.description Access full text - https://doi.org/10.1557/S1092578300000442 en_US
dc.description.abstract GaN layers grown on sapphire substrates were characterized using high resolution optical reflectivity and absorption spectroscopy in the region of ground and excited exciton states. The main exciton parameters are deduced from calculations of reflectivity contours for A and B exciton Sstates. The parameters of the Γ5 state of the A-exciton as well as those of the Γ5 and Γ1 states of the B-exciton are determined from a comparative analysis of reflectivity and absorption spectra in thin layers. The influence of strains inherent to MOCVD-grown GaN layers on the exciton parameters including effective masses and longitudinal-transverse splitting is discussed. Electron transitions from the three (Γ9, Γ7, Γ7) upper valence bands to the second E c2 conduction band of Γ 3 symmetry were evidenced. en_US
dc.language.iso en en_US
dc.publisher Cambridge University Press en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject layers en_US
dc.subject sapphire substrates en_US
dc.subject spectroscopy en_US
dc.subject excitons en_US
dc.title Free excitons in strained MOCVD-grown GaN layers en_US
dc.type Article en_US


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