Design and maskless fabrication of ultrathin suspended membranes of GaN

TIGINYANU, I. M.; POPA, V.; STEVENS-KALCEFF, M. A.; GERTHSEN, D.; BRENNER, P.; PAVLIDIS, D.

dc.contributor.author	TIGINYANU, I. M.
dc.contributor.author	POPA, V.
dc.contributor.author	STEVENS-KALCEFF, M. A.
dc.contributor.author	GERTHSEN, D.
dc.contributor.author	BRENNER, P.
dc.contributor.author	PAVLIDIS, D.
dc.date.accessioned	2020-10-13T10:00:32Z
dc.date.available	2020-10-13T10:00:32Z
dc.date.issued	2012
dc.identifier.citation	TIGINYANU, I. M., POPA, V., STEVENS-KALCEFF, M. A. et al. Design and maskless fabrication of ultrathin suspended membranes of GaN. In: Physica Status Solidi (RRL) – Rapid Research Letters. 2012, V. 6, Nr. 4, pp. 148-150. ISSN ‎1862-6254. Online ISSN 1862-6270.	en_US
dc.identifier.uri	https://doi.org/10.1002/pssr.201206020
dc.identifier.uri	http://repository.utm.md/handle/5014/10696
dc.description	Access full text - https://doi.org/10.1002/pssr.201206020	en_US
dc.description.abstract	We report the maskless fabrication of ultrathin suspended GaN membranes designed by focused ion beam treatment of the GaN epilayer surface with subsequent photoelectrochemical etching. This technological approach allows the fabrication of ultrathin membranes, as well as supporting micro/nanocolumns in a controlled fashion. The analysis of the spatial and spectral distribution of microcathodoluminescence demonstrates that the membranes exhibit mainly yellow luminescence. These results pave the way for the fabrication of ultrathin suspended GaN membranes for MEMS/NEMS applications.	en_US
dc.language.iso	en	en_US
dc.publisher	WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	ultrathin membranes	en_US
dc.subject	ion beams	en_US
dc.subject	photoelectrochemical etching	en_US
dc.title	Design and maskless fabrication of ultrathin suspended membranes of GaN	en_US
dc.type	Article	en_US