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New vapor deposited dielectric polymer thin films for electronic applications
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| dc.contributor.author | SCHRÖDER, Stefan | |
| dc.contributor.author | STRUNSKUS, Thomas | |
| dc.contributor.author | ABABII, Nicolai | |
| dc.contributor.author | LUPAN, Oleg | |
| dc.contributor.author | MAGARIU, Nicolae | |
| dc.contributor.author | FAUPEL, Franz | |
| dc.date.accessioned | 2022-04-20T08:41:40Z | |
| dc.date.available | 2022-04-20T08:41:40Z | |
| dc.date.issued | 2021 | |
| dc.identifier.citation | SCHRÖDER, Stefan, STRUNSKUS, Thomas, ABABII, Nicolai et al. New vapor deposited dielectric polymer thin films for electronic applications. In: International Conference on Electronics, Communications and Computing: proc. IC ECCO, 21-22 Oct. 2021, Chişinău. Republica Moldova, 2021, pp. 94-96. ISBN 978-9975-4264-8-0. | en_US |
| dc.identifier.isbn | 978-9975-4264-8-0 | |
| dc.identifier.uri | http://repository.utm.md/handle/5014/20172 | |
| dc.identifier.uri | https://doi.org/10.52326/ic-ecco.2021/EL.02 | |
| dc.description.abstract | Initiated chemical vapor deposition (iCVD) is a solvent-free polymer thin film deposition process which can be used to produce high quality dielectric thin films with nanoscale control and circumvents thus these problems. This work demonstrates the versatility of the iCVD process in the field of electrical applications by some new application examples of iCVD coatings. | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | Technical University of Moldova | en_US |
| dc.rights | Attribution-NonCommercial-NoDerivs 3.0 United States | * |
| dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
| dc.subject | dielectric thin films | en_US |
| dc.subject | thin films | en_US |
| dc.subject | films | en_US |
| dc.subject | polymer thin films | en_US |
| dc.title | New vapor deposited dielectric polymer thin films for electronic applications | en_US |
| dc.type | Article | en_US |
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2021
Proceedings of the 11th IC|ECCO; October 21-22, 2021
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